Exposure light source: UV LED (imported)

Twilight spectral lines(Line I)：365      nm

Illumination non-uniformity: ±2 %

Exposure Write Speed: 40    mm2/min

Lithography resolution: ≤1 μm

CCD focus detection and detection accuracy：2     μm

Table motion positioning accuracy: ±0.5   μm

Focus table motion sensitivity: 1 μm

Table range of motion:X:100 Y:100     mm

Alignment accuracy: ±2      μm

Focus table travel stroke:6   mm

Turning table stroke: ±6 or more      °

Substrate size

Outer diameter: Φ1-Φ100   mm

Thickness:0.1-5     mm

 

Technical features:

DMD as digital mask, 1024 x 768 or 1920 x 1 080 or 2560 x 1600;

The 1 μm resolution projection lithography objective lens was used for imaging, and the exposure direct writing speed was 40 mm2/min;

 Using patented technology-building block dislocation fly's eye lens to achieve uniform illumination,

 Imported precision grating, motor, guide rail, and lead screw are used to achieve precise workpiece positioning and exposure splicing.

 The CCD focusing system is used to achieve the whole field leveling, automatic field-by-field focusing or automatic field selection focusing exposure;