Lithography band: i-line (365 nm).

Effective field of view: 15 mmx15 mm~22 mmx22 mm

The effective resolution of lithography is 0.5 μm~0.7 μm

Light source mode: mercury lamp/LED

Substrate size: 2~8 inch/custom substrate

Overlay accuracy: better than ±200 nm

Combined yield: 90 pieces/hour

Loading mode: automatic film feeding

Loading mode: Manual/Automatic

Performance monitoring module: lithography performance online measurement and control system (optional).

 

Applications:

It can be widely used in the production fields of integrated circuits, discrete components, optoelectronic devices, MEMS, micro-optical components, acoustic meter devices, sensors and so on.

 

Peculiarity:

 UVSTEP-15105 stepper projection lithography machine adopts modular design, compact structure, cost-effective, and has the functions of automatic loading and unloading, automatic alignment, automatic focusing, step projection exposure, and high-precision layer overlay. UVSTEP-15105 stepper projection lithography machine has the advantages of high degree of automation, good quality of exposure pattern, high overlay accuracy, high production efficiency and simple operation, which is suitable for different types of sub-micron lithography processes, with strong customization ability and high cost performance.