Lithography band: 365 nm

Light source mode: mercury lamp/LED optional

Effective lithography resolution of projection objective: 3 μm

Alignment accuracy: 5μm (sample contour alignment type) ±1um (mark alignment mode).

Air flotation workpiece table stroke: X: >200mm Y: >200mm;

Mask turret travel: 6°

Applicable mask size: 4 inch

Maximum sample size: <ф50 mm

Number of samples for a single plate: 200 pieces (≤Φ12mm).

Production efficiency: >900 pieces/hour (Φ12mm).

 

Applications:

The equipment can automatically complete the alignment of the outer edge contour of the sample, overlay the mask pattern in the center of the sample, and can be compatible with the interlayer overlay in the traditional lithography process, and can be used for the production of micro-nano devices such as dry temperature sensors, pressure sensors, capacitive sensors, and acoustic meter devices.

 

Peculiarity:

 The UVSTEP-50 I 01 sensor chip batch projection lithography machine can automatically complete the contour alignment, layer alignment, focus detection and exposure of all samples in the sample tray, which can adapt to all kinds of customized samples, and has the characteristics of batch processing efficiency, automation quotient, high lithography quality, good exposure consistency, and no matter after the sample is loaded on the plate. The equipment adopts humanized operation interface, good human-computer interaction function, simple operation and stable quotient. In addition , the equipment can provide a sample detection module for users to choose, which can automatically complete sample defect detection and overlay accuracy detection, providing a basis for users to refine production.