Exposure Area:110x110 mm

Lithography resolution:1 (Glue thickness 1.5)    μm

Illumination non-uniformity: ≤3% (Φ100mm range)

Illumination surface light intensity:>30      mW/cm²

Lithography Mask Size: 2.5、3、4、5        inch

Lithography substrate size: Diameter Φ15~Φ100 (can adapt to non-standard pieces or fragments), thickness 0.1-6       mm

Alignment accuracy: ±0.8, the exposure gap and alignment gap can be set digitally μm

Exposure method: Timing (Countdown mode: 0.1-999.9)       s

Imprint resolution: 50 (User Provided Conditions)    nm

Maximum embossing area: Φ75 (other sizes need to be customized)  mm

Imprint Mask Size: 3, 4 (other sizes need to be customized)   inch

Imprint Substrate Dimensions: 2, 3 (the rest of the sizes need to be customized.))     inch

UV curing light source: Compatible with lithography sections

Others: Printing pressure and UV fixed-line time can be accurately controlled

 

Technical features:

 The imprint technology adopts the mature ultraviolet curing nanoimprint production process.

 Low-cost discretion resolution nano pattern production,

 The "one-button" operation mode completes the nanoimprint process

 High-precision video alignment technology is used to achieve complex graphic overlay production (compatible with lithography parts),

 The high-precision drive mechanism can realize multiple overlays of nano patterns (compatible with lithography parts),

 Patented lighting technology for precise curing of nano patterns (compatible with lithography parts),

 The imprint module is independently designed, and can be embedded in traditional lithography equipment to achieve nanoimprint.

 The equipment has reliable performance and friendly operation interface, which can meet the personalized customization needs of customers.

 It is especially suitable for teaching and scientific research in colleges and universities (good reliability and convenient demonstration) and factories (high efficiency).