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URE-2000/30 (Customized) Ultraviolet Lithography Machine Product Specifications

添加时间:2024-06-25 18:00:39

URE-2000/30 (Customized) Ultraviolet Lithography Machine Product Specifications

 

1. Technical parameters

  • Exposure area: 4 inches
  • Exposure wavelength 1: 365nm or 405nm (switchable, filter changeable),
  • Exposure wavelength 2: 248nm
  • Exposure position 1 and exposure position 2 are automatically switched
  • Resolution: 0.8-1μm
  • Mask size: 2.5 inches, 3 inches, 4 inches, 5 inches (standard configuration, other sizes can be customized)
  • Sample size: diameter Φ10mm--Φ100mm or 15mm×15mm-100mm×100mm (standard configuration, other sizes can be customized), the thickness can be adapted to 0.1mm--5mm (the maximum can be expanded to 15mm)
  • Exposure method: Timed (countdown mode)
  • It has four functions: vacuum contact exposure, hard contact exposure, pressure contact exposure, and proximity exposure
  • Illumination non-uniformity: 3% (Φ100mm range).
  • Leveling the contact pressure is guaranteed to be repeatable by means of a sensor
  • Digitally set alignment gap and exposure gap
  • Mask relative to sample stroke: X: better than ±5mm; Y: Better than ±5mm;  Thetata: better than ±6º
  • Maximum coke thickness: 400μm (SU8 glue, user-provided testing conditions).
  • Light source parallelism: <3º
  • Exposure energy density 1: >20mW/cm² (365 or 405 nm), illumination surface temperature < 35º
  • Exposure energy density 2: >3mW/cm² (248nm).
  • Single-layer exposure is done with one click
  • Ball air float automatic leveling is adopted
  • Mercury lamp power: 350W (DC, imported mercury lamp)

2. Dimensions: about 1400mm (length), × 900mm (width) × 1800mm (height).

 

3. Configuration

The equipment is mainly composed of uniform illumination exposure system, workpiece table system, electronic control system, pneumatic control system and auxiliary equipment.

 

serial number

Subsystems/components

Configuration/Specifications

1

Light source system 1

(365nm、405nm)

  • Cold-light ellipsoids
  • 350W imported DC high voltage mercury lamp (imported)
  • XYZ mercury lamp adjustment table
  • Cooling fan
  • Optical system: fixed light bar, variable light bar, shutter, collimating mirror mirror 1, collimating mirror mirror 2, fly's eye lens group (79 lenses), filter, field mirror 1, cold light reflector 1, reflector 2

2

Light source system 2

(248nm)

  • Cold-light ellipsoids
  • 350W imported DC high voltage mercury lamp (imported)
  • XYZ mercury lamp adjustment table
  • Cooling fan
  • Optical system: shutter, collimating mirror 1, collimating mirror 2, fly eye lens group, field lens 1, cold light mirror 1, reflector 2

3

Align the workpiece table

  • The mask is relative to the motion table
  • Turntable
  • Sample leveling mechanism, automatic
  • Substrate pull-out upper and lower mechanism
  • Sample focusing mechanism, motor automatic adjustment
  • 4 substrate tables: Φ15mm, 2 inches, 3 inches, 4 inches
  • 4 mask clamps: 2.5 inches, 3 inches, 4 inches, 5 inches

4

Electronic control system

  • Mercury lamp trigger power supply (350W DC mercury lamp) 2 sets
  • Control system
  • Control cabinet table

5

Pneumatic system

  • Cylinders, solenoid valves, pressure reducing valves, pneumatic switches, etc
  • Solenoid valve actuated
  • Pneumatic instrumentation

6

Other accessories

  • One vacuum pump (oil-free pump)
  • One air compressor (silent pump)
  • pipeline

7

Technical information

  • Instruction manual for use, certificate of conformity
 

 

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