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IOE Lithography光刻机

URE-2000S/A double-sided lithography machine

添加时间:2024-06-21 18:16:17

1. Main technical parameters

  • Exposure area: 6 inches
  • Exposure wavelength: 365nm: 20mW/cm2; 405nm:20-35mW/cm2
  • Resolution: 1 μm
  • Alignment accuracy: ±2 μm (double-sided, sheet thickness 0.8 mm), ± 0.8 μm (single-sided).
  • Mask sizes: 3", 4", 5", 7".
  • Sample sizes: 2", 3", 4", 6"; Thickness 0.1mm-6mm
  • Exposure method: timed (countdown mode) and fixed dose
  • Leveling the contact pressure is guaranteed to be repeatable by means of a sensor
  • Digitally set alignment gap and exposure gap
  • It has an interface to the imprint module and also has an interface to the proximity module
  • The front alignment adopts binocular dual-field alignment microscope: it can be visually aligned through the eyepiece, or it can be aligned by CCD+ display, optical synthesis, the maximum optical magnification is 400 times, and the optical + electronic magnification is 800 times; Three pairs of objective lenses: 4x, 10x, 20x; Three pairs of eyepieces: 10x, 16x, 20x
  • Bottom surface alignment: double microscope objective lens + CCD + acquisition card + computer combining, objective lens wheelbase range 10mm-148mm
  • Illumination non-uniformity: 2.5% (Φ100mm range); 3% (Φ150mm range).
  • Mask relative to sample movement: X: ±5mm; Y:±5mm; Thetata: ±6 degrees
  • Maximum gel thickness: 500 μm (SU8 gel, user-provided detection conditions).
  • Light source parallelism: 2°
  • It has a circulating water cooling system
  • Mercury lamp power: 1000W (DC, import).

2. Dimensions: 1400mm (length), × 1200mm (width) ×2000mm (height).

3. Equipment composition and configuration details

The equipment is mainly composed of uniform illumination exposure system (exposure head), alignment workpiece table system, binocular dual-field microscope system, bottom CCD alignment system, electronic control system, pneumatic control system and auxiliary supporting equipment.

(1) The exposure head system includes:

  • Cold-light ellipsoids
  • 1000 W imported DC high-voltage mercury lamp (Osram, Germany).
  • XYZ Mercury Lamp Adjustment Table
  • Cooling fan
  • Optical system: fixed light bar, variable light bar, shutter, collimating mirror 1, collimating mirror 2, fly's eye lens group (more than 109 lenses), I-line filter, field mirror, cold light mirror 1, reflector 2

(2) The alignment workpiece table system comprises:

  • Mask Relative Motion Table (XY).
  • Rotary table (θ)
  • Automatic leveling mechanism for samples
  • Sample focusing mechanism
  • 4 film decks (2 inches, 3 inches, 4 inches, 6 inches).
  • 4 mask bases (3 inches, 4 inches, 5 inches, 7 inches).
  • Mask flipping and rotation mechanism

(3) Alignment microscope (optional with CCD type, eyepiece and monitor can be observed at the same time) The system includes:

  • LED lighting and supporting power supply
  • Binocular bin-field alignment with the microscope body
  • 3 pairs of eyepieces (10x, 16x, 20x, 6 in total).
  •  3 pairs of objective lenses (4x, 10x, 20x, 6 in total).
  • CCD and optical imaging systems
  • The XYZ underside aligns the workpiece table (two sets).

(4) Bottom CCD alignment system

  • LED lighting and supporting power supply
  • CCD & Optical Imaging System (2 sets).
  • Data Acquisition Cards

(5) Electronic control system

  • Mercury lamp trigger power supply (1000W DC mercury lamp).
  • MCU control system
  • Control cabinet table
  • Computer system (22-inch widescreen LCD).

(6) Pneumatic system

  • Cylinders, solenoid valves, pressure reducing valves, pneumatic switches, etc
  • Solenoid valve actuated
  • Pneumatic instrumentation

(7) Other accessories (optional).

  • One vacuum pump (oil-free silent type)
  • One air compressor (oil-free and silent type)
  • Constant temperature circulating water cooling system
  • pipeline

(8) Technical data

  • Equipment use and maintenance manual

4. Delivery time: within 2 months after signing the contract.

5. Quotation: about 450,000 RMB, confirmed or adjusted according to the configuration