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IOE Lithography光刻机

URE-2000S/25A double-sided lithography machine

添加时间:2024-06-21 18:16:59

1. Technical parameters

  • Exposure area: 6 inches
  • Exposure wavelength: 365nm:
  • Power density: >25mW/cm2
  • Resolution: 1 μm
  • Frontal binocular dual-field alignment microscope:
  • It can be visually aligned through the eyepiece, or by CCD+ display, optical combining, the maximum optical magnification is 400 times, the optical + electronic magnification is 800 times, and the objective lens is three pairs: 4 times, 10 times, and 20 times; Eyepiece triple pairs: 4x, 10x, 20x
  • Frontal vertical dual CCD alignment system, optical magnification, 0.65-4.5x; Side-facing light source
  • Bottom surface alignment: double microscope objective lens + CCD + acquisition card + computer combining, objective lens wheelbase range 10mm-148mm
  • Alignment accuracy: ±2 μm (double-sided, sheet thickness 0.8 mm), ± 0.8 μm (single-sided).
  • Mask sizes: 3 inches, 4 inches, 5 inches, 7 inches
  • Sample sizes: 2", 3", 4", 6"; Thickness: 0.1mm--2mm (double-sided).
  • Exposure method: timed (countdown mode) and fixed dose
  • Illumination non-uniformity: 2.5% (Φ100mm range); 4% (Φ150 mm range).
  • Mask relative to sample movement: X: ±5mm; Y: ±5mm; Thema: ±6 degrees
  • Mercury lamp power: 350W (DC, inlet).
  • Leveling the contact pressure is guaranteed to be repeatable by means of a sensor
  • Digitally set alignment gap and exposure gap
  • It has an interface to the imprint module and also has an interface to the proximity module
  • Maximum gel thickness: 350 μm (SU8 gel, user-provided detection conditions).
  • Light source parallelism: 3.5°

2. Dimensions: 1300mm (length), × 900mm (width) × 1800mm (height).

3. Configuration

(1) Exposure head

  • Cold-light ellipsoids
  • 350 W imported DC high-voltage mercury lamp (Osram, Germany).
  • XYZ Mercury Lamp Adjustment Table
  • Cooling fan
  • Optical system: fixed light bar, variable light bar, shutter, collimating mirror 1, collimating mirror 2, fly's eye lens group (79 lenses), I-line filter, field mirror 1, cold light reflector 1, reflector 2

(2) Align the workpiece table

  • The mask is relative to the motion table
  • Turntable
  • Sample leveling mechanism, automatic
  • Sample focusing mechanism, cylinder automatic adjustment
  • 4 receptacles (2", 3", 4", 6".
  • 4 mask clamps (3", 4", 5", 7".
  • Mask pull-out upper and lower mechanism

(3) Binocular dual-field alignment microscope (with CCD, eyepiece and monitor for simultaneous observation).

  • Light source, power supply
  • Binocular bin-field alignment with the microscope body
  • 3 pairs of eyepieces (10x, 16x, 20x, 6 in total).
  •  3 pairs of objective lenses (4x, 10x, 20x, 6 in total).
  • Vertical dual CCD optical alignment system
  • Aim the light source sideways

(4) Bottom CCD alignment system

  • Light source, power supply
  • Imaging optics
  • Data Acquisition Cards
  • CCD

(5) Electronic control system

  • Mercury lamp trigger power supply (350W DC mercury lamp).
  • MCU control system
  • Control cabinet table
  • Computer system (21-inch widescreen LCD).

(6) Pneumatic system

  • Cylinders, solenoid valves, pressure reducing valves, pneumatic switches, etc
  • Solenoid valve actuated
  • Pneumatic instrumentation

(7) Other attachments

  • One vacuum pump (oil-free pump)
  • One air compressor (sound and static pump)
  • pipeline

(8) Technical data

  • Use the service manual
  • Microscope instruction manual

4. Lead time: 1-2 months

5. Quotation: about 400,000 RMB, confirmed or adjusted according to the configuration