1. Main technical indicators of equipment:
(1) Exposure area: 200mm×200mm;
(2) Resolution: ≤2μm;
(3) Alignment accuracy: ±2μm;
(4) Mask size: 5 inches, 7 inches, 9 inches;
(5) Sample size: 4 inches, 6 inches, 8 inches;
(6) Wafer Chuck surface: anti-light reflection coating;
(7) The overall motion range of the mask pattern: X: 10mm; Y:10mm;
(8) Mask relative to sample movement stroke: X: ±5mm; Y: ±5mm; θ: ±6°;
(9) Mercury lamp power: 1000W (DC);
(10) Exposure energy density: ≥ 15mW/cm2 ;
(11) Peak exposure wavelength: 365nm;
(12) Exposure mode: timing (countdown mode: 0.1s-999.9s);
(13) Leveling the contact pressure is guaranteed to be repeated through the sensor
(14) Digitally set the alignment gap and exposure gap
(15) It has an imprint module interface, and also has a proximity module interface
2. The main components of the technology
(1) The exposure head system includes:
(2) The alignment workpiece table system comprises:
(3) The CCD alignment microscope system comprises:
(5) Electronic control system:
(6) The pneumatic system system includes:
(7) Other configurations and accessories
3. Relevant technical information:
4. Quotation: about 570,000 RMB, confirmed or adjusted according to the configuration
5. Delivery time 2 months