1. Main technical indicators of equipment:
(1) Exposure area: 300mm×300mm;
(2) Resolution: ≤2μm;
(3) Alignment accuracy: ±2μm;
(4) Mask size: 7 inches, 9 inches, 13 inches;
(5) Sample size: 6 inches, 8 inches, 12 inches;
(6) Wafer Chuck surface: anti-light reflection coating;
(7) The overall motion range of the mask pattern: X: 10mm; Y:10mm;
(8) Mask relative to sample movement stroke: X: ±5mm; Y: ±5mm; θ: ±6°;
(9) Mercury lamp power: 1000W (DC);
(10) Exposure energy density: ≥ 10mW/cm2;
(11) Peak exposure wavelength: 365nm;
(12) Parallelism of light source: <2°;
(13) Exposure mode: timing (countdown mode: 0.1s-9999.9s);
(14) Lithography fixture compatibility
2. The main components of the technology
(1) The exposure head system includes:
(2) The alignment workpiece table system comprises:
(3) The CCD alignment microscope system comprises:
(5) Electronic control system:
(6) The pneumatic system system includes:
(7) Other configurations and accessories
3. Relevant technical information:
4. Quotation: about 700,000 RMB, confirmed or adjusted according to the configuration
5. Delivery time: 3 months