Exposure Area:110x110-650x650        mm

Exposure wavelength:254、310、365、405      nm

Lithography resolution:0.8-5       μm

Illumination non-uniformity: ≤2% (Φ100mm), ≤8% (Φ300mm)

Light source type: LED or mercury lamp: 350W, 1000W, 2500W

Exposure Energy Density:LED:≥100Recording Lights:≥40            mW/cm²

Exposure settings:Countdown mode, 0.1-999.9 can be set arbitrarily   s

Exposure Gap Setting: Numerical setting

 

Technical features:

• Using the patented technology - building block dislocation fly's eye lens anti-diffraction technology, the exposure pattern quality is good, and the lithography resolution is high;
• The i-line (365 nm) ultraviolet exposure light source and advanced optical system are used to achieve high uniform illumination, with small light gathering angle and good parallelism.
• Patented technology - high-precision fast automatic leveling mechanism and focusing mechanism are used to achieve automatic substrate leveling and focusing, and have high leveling accuracy for large and small substrates (including fragments);
• It is equipped with a binocular dual-field microscope and a 22-inch widescreen LCD monitor, which can be visually aligned through the eyepiece or CCD+ display, with accurate alignment, intuitive process and convenient operation;
• The alignment gap and exposure gap can be set digitally, and the alignment gap and exposure gap can be automatically separated and eliminated.
• It has four functions: vacuum contact exposure, hard contact exposure, pressure belly exposure, and proximity exposure;
• The upper and lower substrates are pull-out type, which is easy to operate.
• It has the function of nanoimprint interface;
• With fragmentation processing function,
• The whole machine has a high degree of automation, reliable performance and a wide range of applications;

 

Model：

URE-2000/17、URE-2000/25(L)、URE-2000/35(L)、URE-2000/35A(AL)、URE-2000/30(L)、URE-2000/30A(AL)、URE-2000/A8(L)、URE-2000/A12、URE-2000D